PECVD PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

APPLICATION

The PECVD system (plasma enhanced chemical vapor deposition system) consists of four modules: a tube furnace, vacuum acquisition, flow control, and radio frequency power supply. This equipment uses a 13.56MHz radio frequency output to ionize the gas containing the atoms of the thin film, forming a plasma in the vacuum chamber. By utilizing the strong chemical activity of the plasma, the reaction conditions are improved, and the gaseous substances containing the thin film undergo chemical reactions, thus achieving a new preparation technology for the growth of thin film materials. Finally, the desired thin film is deposited on the substrate, which is suitable for depositing SiO2 and SiNx thin films at 1200 ℃.

PRODUCT DESCRIPTION

The PECVD tube furnace system consists of a tube furnace, vacuum acquisition, flow control, and RF power supply.

The tube furnace can choose different pipe diameters and the length of the constant temperature zone, and high vacuum stainless steel sealing flanges are installed at both ends of the furnace tube.

The vacuum acquisition system can choose different vacuum pumps according to the test requirements. The vacuum degree of the rotary vane mechanical vacuum pump is ≤ 5Pa, and the vacuum degree of the molecular pump vacuum unit is 1x10-4Pa. The gas supply system can choose from 3 float manual and 3 automatic mass flow systems.

Vacuum measurement is done using a digital composite vacuum machine or a Pirani vacuum gauge.

Select a 13.56MHz equipment power supply for plasma discharge, with power outputs of 200W, 300W, and 500W.

The tube furnace can choose single temperature zones of 300mm and 440mm, or three temperature zones or multiple temperature zones for temperature gradient testing.

The built-in RS485 digital communication port and USB adapter of the temperature controller are optional configurations, which can be connected to a PC for remote control and monitoring of the system, and can also save or export test results.

The product complies with the EU CE standard.

PRODUCT FEATURES

Furnace material: Polycrystalline inorganic alumina ceramic fiber material prepared by temperature method vacuum filtration molding.

Furnace tube material: Quartz tube is used at 1200 ℃.

Temperature control instrument: intelligent microcomputer PID temperature control instrument, SCR/SSR control, PID parameter self-tuning function; Programmable for 30 time periods, including program heating, program insulation, and program cooling.

Heating rate: 1-25 ℃/min * * adjustable.

Furnace body structure: furnace temperature control integrated structure, furnace opening and closing type; Double layered shell, air circulation insulation.

Sealing performance: The furnace tube is equipped with stainless steel metal flanges at both ends, matched with bright temperature PTFE gaskets, and can work under vacuum with a vacuum degree of ≤ 5Pa (rotary vane vacuum pump).

RF power supply: frequency 13.56MHz ± 0.005%, power 5-500W, power stability ± 0.5%.

Gas control: Three float manual options are available, with a range of 60-600ml/min; 3-channel automatic mass flow system with a range of 1-500sccm.

Atmosphere performance: There are inlet and outlet ports at both ends of the flange, and the pressure gauge is installed on the metal flange. The precision needle valve can adjust the inlet and outlet volume, and can introduce gases such as nitrogen, argon, hydrogen, etc.

Gas interface: KF25 vacuum baffle valve and KF25 stainless steel corrugated pipe connected to vacuum pump; Protect the atmosphere with 6mm stainless steel card sleeve joints and PTFF pipelines.

Equipment protection: Modular control, which will emit sound and light signals in case of overheating or disconnection during operation, and automatically complete the protection action.

L Safety protection: There is an air circuit breaker installed on the equipment, which will automatically trip in case of short circuit leakage, protecting the safety of the equipment and operators.