CK450B magnetron sputtering coater

Main Applications:

It is used for the preparation of new thin film materials such as nano-scale single-layer and multi-layer functional films, hard films, metal films, semiconductor films, dielectric films, etc. It is widely used in thin film material research and small-batch preparation in colleges, universities and research institutes.

System composition:

It is mainly composed of vacuum chamber system, sputtering chamber, target and power supply system, sample stage system, vacuum pumping and measurement system, gas path system, control system, film thickness test system, upper cover lifting mechanism, electronic control system, computer control system and auxiliary system.

Technical indicators:

Ultimate vacuum degree: 6.7×10-5Pa, system leakage rate: 1×10-7PaL/S;

Vacuum recovery time: 40 minutes to reach 6.6×10 Pa (after a short exposure to the atmosphere and filling with dry nitrogen, vacuuming begins);

Vacuum chamber: circular vacuum chamber, size 450×350mm;

Sample stage: 3 inches × 3 inches, 3.2 mm thick flat sample, the sample stage maximum temperature is 600 ° C ± 1 ° C program temperature control, the sample can rotate (uniformity) and revolve (transposition), the rotation speed is 0 ~ 50 rpm;

Magnetron target: effective sputtering area is 3 inches × 3 inches, quantity: 3, standard permanent magnet target, indirect water cooling structure;

Coating method: The magnetron target is a straight target, and the film is formed by sputtering upwards;

Substrate: negative bias -200V;

Gas system: 2 mass flow controllers;

Quartz crystal oscillator film thickness controller: film thickness measurement range 0-999999Å;

Optional molecular pump group or cryogenic pump combined with vortex dry pump exhaust system;

The computer control system collects real-time data on displacement and sample revolution speed over time, calculates displacement errors, and displays them as curves and numerical values. The sample revolution speed versus displacement curve can be switched between linear and logarithmic scales, enabling transposition and fixed-point coating.