THERMAL EVAPORATION COATING INSTRUMENT

PRODUCT DESCRIPTION

This equipment is designed specifically for colleges, research institutions, and small R&D laboratories. Based on thermal evaporation coating technology, the target material is vaporized by heating in a vacuum environment, and then vapor deposited on the substrate surface to form a uniform thin film. The materials that can be processed include:

·Metal materials (such as low melting point metals such as copper, aluminum, gold, silver, etc.);

·Semiconductor materials (such as silicon, germanium, etc.);

·Organic materials (such as organic luminescent molecules, polymers);

·Oxides/salts (such as volatile compounds such as silica and sodium chloride).

The equipment is suitable for preparing the following functional films:

·In the field of electronic information: electrode films for microelectronic devices, flexible electronic conductive layers;

·In the field of optics, there are anti reflective films, reflective films, and infrared filter films for optical components;

·Biomedical field: Biosensor coatings, controllable degradation films;

·Basic research areas: Nanomaterial coating layer, two-dimensional material heterojunction interface layer.

PRODUCT FEATURES

1. * * Sedimentation capacity

·Advantages of thermal evaporation technology: By heating the target material with resistance or electron beam, the material can be directly vaporized and deposited. The process is simple and suitable for high-purity thin film preparation;

·Adjustable deposition rate: By controlling the heating power (0-1000W) and evaporation time, the film thickness can be controlled at the nanometer to micrometer level, with a uniformity error of less than 3%.

2. Intelligent process control

·Automation process: equipped with PLC control system, supporting preset 10 or more process programs, automatically completing the entire process of vacuum pumping, heating and evaporation, cooling, and vacuum breaking after one click start;

·Precision temperature control system: The substrate stage is equipped with a heating module (* * temperature 300 ℃), which supports constant temperature or gradient temperature control, optimizing film adhesion and crystal quality.

3. Flexible vacuum environment

·High vacuum performance: using a combination of mechanical pump and diffusion pump, the ultimate vacuum degree can reach 5 × 10 ? 3 Pa, reducing the pollution of gas molecules on the film;

·Atmosphere compatibility: Supports the introduction of inert gases (such as Ar, N ?) for protective deposition, or reactive gases (such as O ?, NH ∝) for in-situ modification.

4. Humanized design

·Visual operation: equipped with a color touch screen, real-time display of parameters such as vacuum degree, temperature, heating power, etc., supporting data storage and USB export;

·Safety protection: equipped with functions such as vacuum interlocking, overheating protection, and leakage monitoring to ensure the safety of personnel and samples;

·Easy maintenance: The evaporation source adopts a quick detachable structure, and the replacement of the target material and cleaning of the chamber can be completed within 15 minutes.

5. Scalability configuration

·Optional upgrade module:

·Film thickness monitoring instrument (quartz crystal oscillation method): Real time monitoring of film growth rate and thickness;

·Multi source evaporation component: supports 2-4 evaporation sources to achieve multi-layer or alloy film preparation;

·Substrate rotation device (speed 0-150 rpm): improves film uniformity and is suitable for large-area substrates.

TYPICAL APPLICATION SCENARIOS

1. Microelectronics manufacturing: evaporating gold electrodes on silicon substrates for the preparation of MEMS devices;

2. Optical coating: alternate evaporation of SiO ? and TiO ? on a glass substrate to prepare a visible spectrum anti reflective film;

3. Flexible electronics: evaporating silver nanoparticle conductive film on polyethylene terephthalate (PET) substrate;

4. Research experiment: Evaporation of molybdenum diselenide (MoSe ?) nanolayers on mica sheets for the study of two-dimensional material devices.

SUMMARY OF EQUIPMENT ADVANTAGES

·Multifunctionality: Supports single source evaporation, multi-source co evaporation, and reactive evaporation, adapting to diverse research needs;

·High precision control: parameter errors such as vacuum degree, temperature, evaporation rate, etc. are less than 2%, and the experimental repeatability is excellent;

·Low energy consumption design: adopting energy-saving heating power supply, energy consumption is reduced by 15% compared to traditional equipment, suitable for long-term operation.