Henan Yiyong Intelligent Technology Co., Ltd

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National Consultation Hotline：

15738867410

Company address：

Greenland Binhu International City (District 1), Erqi District, Zhengzhou City, Henan Province

1200℃ Intelligent PECVD System

The Intelligent PECVD-500A-D is the latest model with all integrated control components. It can be equipped with a PE RF power supply, upgrading the CVD system to PECVD.

Details

1200℃ Intelligent PECVD System

1. Equipment Introduction:

The Intelligent PECVD-500A-D is the latest model with all integrated control components. It can be equipped with a PE RF power supply, upgrading the CVD system to PECVD. When the reacting atmosphere enters the furnace tube, the RF power supply generates plasma, which promotes a more complete reaction. This plasma also acts as a reinforcement, significantly optimizing experimental process conditions. Our companys slide-type PECVD system ensures that the entire experimental chamber is within the glow generation zone, creating a uniform and equal glow. This technology effectively resolves the instability of traditional plasma operation. The resulting ionization range and intensity are a hundred times greater than those of traditional PECVD, eliminating uneven material accumulation. Compared to traditional CVD systems, the growth temperature is lower. The slide-type furnace achieves rapid heating and cooling, and the equipments unique patented technology ensures a uniform and equal glow throughout the tube, ensuring consistent growth.

2. Product Features:

1. High film deposition rate: RF glow technology greatly improves the deposition rate of thin films, which can reach 10Å/S.

2. High uniformity over large areas: Using advanced multi-point RF feeding technology, special gas path distribution and heating technology, the film uniformity index reaches 8%.

3. High consistency: Using advanced design concepts in the semiconductor industry, the deviation between each substrate deposited in one go is less than 2%.

4. High process stability: Highly stable equipment ensures the continuity and stability of the process.

3. Product parameters:

Single temperature zone heating system
Input power	Single phase, 220V 50Hz
Rated power	3KW
Maximum temperature	1200℃
Operating temperature	≤1100℃
Temperature control method	30-segment programmable temperature control, PID parameter self-tuning, built-in PLC control program The temperature control system and the sliding (time and distance) of the slide rail furnace can be set to program control
Heating zone length	440mm
Length of constant temperature zone	200mm
Temperature control accuracy	±1℃
Effective size of furnace	Ф60*1650mm
Heating element	Resistance wire (molybdenum-doped iron-chromium-aluminum alloy)
Thermocouple	K-type thermocouple
Furnace material	Alumina, high temperature fiber products
PE RF power supply
This CVD system can be equipped with a PE RF power supply, upgrading the CVD system to PECVD. When the reacting atmosphere enters the furnace tube, the RF power generates ions, which promote a more complete reaction. The plasma also acts as a booster, significantly optimizing experimental process conditions.
Signal frequency	13.56MHz±0.005%
Power output range	500W
RF output interface	50 Ω, N-type, female
Power stability	±0.1%
Harmonic components	≤-50dbc
Supply voltage	Single-phase AC (187V-253V) frequency 50/60HZ
Overall efficiency	≥70%
Power Factor	≥90%
Cooling method	Forced air cooling
Five-way proton flow control system
The gas supply system can control the mixing ratio of 4 gases at different flow rates. A gas scrubber can also be installed according to experimental requirements. The mass flow meter is installed in a sealed movable cabinet and is composed of ultra-clean double-polished stainless steel pipes connected with precision double-ferrule connectors, and is controlled by a touch screen.
Connector Type	Double ferrule stainless steel connector
Standard range (N ₂)	Argon: 1000 sccm, Hydrogen: 300 sccm, Methane: 100 sccm, Nitrogen: 500 sccm, Oxygen: 100 sccm
Accuracy	±1.5%
Linear	±0.5~1.5%
Repeatability	±0.2%
Response time	Gas characteristics: 1~4 Sec, Electrical characteristics: 10 Sec
Working pressure difference range	0.1～0.5 MPa
Maximum pressure	3MPa
interface	Φ6 or 1/4 optional
show	4-digit display
Working environment temperature	5~45 high purity gas
Pressure vacuum gauge	-0.1～0.15 MPa, 0.01 MPa/grid
Vacuum unit
The vacuum unit is equipped with a bipolar rotary vane mechanical pump, a capacitance vacuum gauge, and supporting bellows, a manual flapper valve, clamps, and other connecting components. The equipments cold-state ultimate vacuum can reach 0.5 Pa.
Operating voltage	220V±10% 50~60HZ
power	1KW
Pumping rate	16m³/h
Ultimate vacuum	0.5Pa
Air intake diameter	KF25
Exhaust port diameter	KF25
Connection method	Use bellows, the manual flapper valve is connected to the bellows
Capacitance vacuum gauge	ZDM-I (with communication) can communicate with touch screen
	Vacuum gauge measurement range optional 5-5000Pa
	No coefficient conversion is required due to different types of measured gases
	High accuracy and repeatability, short response time
Pressure control system
Main components	Butterfly valve, pressure controller, capacitance vacuum gauge
effect	According to the experimental requirements, add a butterfly valve (regulating valve) and a vacuum gauge between the outlet and the pump.
	The vacuum gauge can detect the pressure in the pipe and adjust the opening size of the butterfly valve (regulating valve) through the PLC
	To achieve constant pressure in the control tube
Pressure range	100~100000Pa
Control accuracy	±5% of measured value

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