Small magnetron sputtering coater

1. Vacuum chamber: 246*228 high quality stainless steel, argon arc welding;

2. Substrate stage: size 100mm, 60-120mm height adjustable, rotatable and heated to 300 degrees;

3. Vacuum system: mechanical pump + imported molecular pump ;

4. Ultimate vacuum: 8.0×10 -5 Pa;

5. Vacuum pumping speed: atmosphere ~ 8×10 -4 Pa ≤ 30min;

6. Vacuum measurement: full-range compound vacuum gauge, measuring range: 10 5 Pa ~ 10 -5 Pa;

7. Magnetron target: 2 Φ2-inch targets (including target baffle), compatible with DC power supply and RF power supply;

8. Sputtering power supply: 1 500W DC sputtering power supply and 1 300W fully automatic matching RF power supply;

9.Mass flow meter: one set of imported 10sccm and 50sccm controllers;

10. Film thickness control system: imported Inficon SQM-160 single water-cooled probe, accuracy 0.1Å (optional);

11. Control mode: PLC + touch screen intelligent control system, with functions such as air leakage self-detection and prompt, communication fault self-detection, maintenance prompt, etc.

12. Equipment appearance: L60cm×W60cm×H96cm mechatronic frame, with one CF35 flange interface reserved;

13. The total power supply of the equipment is ≤ 2KW, 220V, single-phase three-wire system (one live, one neutral, and one ground);

14. Cooling circulation system: water pressure 0.2~0.4MPa, water temperature 10~25℃, providing stable cooling water to equipment-related components that require water cooling .