Perovskite coating equipment

Equipment use:

It is suitable for the preparation of single-element metal thin films, semiconductor thin films, oxide thin films, organic thin films, etc. It can be used by scientific research institutions to conduct research on new materials and new process thin films, and can also be used for pre-mass production testing. The user group of the OPV series vacuum evaporation coating and glove box combined system is research institutes and laboratories. The vacuum evaporation system studio is placed in the water-free, oxygen-free, and dust-free ultra-pure environment of the glove box. The PVD and glove box hardware are seamlessly connected, and the control is integrated into one. It is widely used in research fields such as organic, inorganic, perovskite thin-film solar cells, and OLEDs. 

Equipment composition:

The equipment primarily consists of an organic/metallic source evaporation chamber, a vacuum exhaust system, a vacuum measurement system, an evaporation source, sample heating and temperature control, an electronic control system, and a gas distribution system. 

Technical Requirements: 

1. Coating Chamber: The coating chamber measures approximately 600×450×450mm and is constructed of stainless steel. It features a square front and rear door structure with internal anti-fouling panels . 

2. Exhaust System: A molecular pump combined with a mechanical pump is used. 

2.1. Vacuum Level: The ultimate vacuum of the coating chamber is ≤6×10-4Pa. 

2.2. System Leakage Rate: ≤1×10-7PaL/s. 

3. Evaporation Source System: 

3.1. Four organic source evaporation sources, each with a volume of 5ml, and two evaporation power supplies with temperature measurement and control, a heating temperature of 400°C, and a power output of 0.5kW. 

3.2. Baffle: The evaporation source baffle is automatically magnetically controlled to maintain its opening. 

3.3. Installation: The evaporation source is mounted on the bottom of the vacuum chamber. 

4. Sample Holder System: 

4.1. The sample holder can hold samples up to 120mm in diameter and glass slides. 

4.2. The sample holder rotates at a speed of 0-30 rpm. 

4.3. Installation: The sample is mounted on the upper cover of the vacuum chamber, and the evaporation source is mounted on the lower cover. The evaporation source is equipped with a baffle for upward evaporation. 

5. During the coating process, the sample is heated and baked, with a maximum heating temperature of room temperature to 180°C, controlled by temperature measurement. 

6. The equipment is equipped with an interlocking alarm for water and power outages, as well as an alarm to prevent misoperation. 

7. Four sets of inorganic evaporation sources, each with a capacity of 5ml, and two evaporation power supplies with a heating current of 300A and a power output of 3.2kW. 

8. Quartz crystal oscillator film thickness controller: The film thickness measurement range is 0-999999A .